Patent · US Active

Radical anion functionalization of two-dimensional materials

US11453596B2 · kind B2 · utility

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19Claims
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Key dates

Filing dateFeb 28, 2020
Grant dateSep 27, 2022
Priority date
Expiry dateFeb 28, 2040

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2004/20
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A radical anion based functionalization of two-dimensional (2D) layered materials is proposed. The covalent functionalization of the basal plane of 2D materials with charge neutral radicals is typically unstable to reduction, leading to detachment of the functional groups from the basal plane upon reduction. This instability hinders the use of functionalized 2D materials as rechargeable electroactive species, unless the functional groups are bound to the edges of the 2D material. However, to achieve high capacity without the creation of many edges and defects, a stable functionalization of the basal plane in the reduced state is required. This goal can be achieved by radical anion functionalization, whereby the reduced/discharged state of the basal-plane-functionalized 2D material is produced. The product of the radical anion functionalization can be used as the discharged state of a cathode active material, solid electrolyte or part of a polymer composite.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.