Vertical memory devices
US11456335B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 24, 2020 |
| Grant date | Sep 27, 2022 |
| Priority date | — |
| Expiry date | Oct 14, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B43/10
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A vertical memory device includes circuit patterns of peripheral circuits on a substrate, the circuit patterns including a lower conductive pattern, cell stack structures over the circuit patterns and spaced apart in a first horizontal direction, wherein each of the cell stack structures includes gate electrodes spaced apart in a vertical direction, a first insulating interlayer covering the cell stack structures and a portion between the cell stack structures, a through via contact passing through the first insulating interlayer between the cell stack structures to contact an upper surface of the lower conductive pattern, at least one dummy through via contact passing through the first insulating interlayer between the cell stack structures and disposed adjacent to the through via contact, and upper wiring on the through via contact.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.