Patent · US Active

Methods for optical system manufacturing

US11460648B2 · kind B2 · utility

1Cited by
25References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 20, 2021
Grant dateOct 4, 2022
Priority date
Expiry dateApr 20, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01S7/4818
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Systems and methods described herein relate to the manufacture of optical elements and optical systems. An example method includes providing a first substrate that has a plurality of light-emitter devices disposed on a first surface. The method includes providing a second substrate that has a mounting surface defining a reference plane. The method includes forming a structure and an optical spacer on the mounting surface of the second substrate. The method additionally includes coupling the first and second substrates together such that the first surface of the first substrate faces the mounting surface of the second substrate at an angle with respect to the reference plane.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.