Patent · US Active

Method for adusting a first element of a lithography apparatus towards a second element of a lithography apparatus by a tunable spacer

US11460780B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventor

Boaz Pnini · Deggingen, DE

Key dates

Filing date	Apr 12, 2021
Grant date	Oct 4, 2022
Priority date	—
Expiry date	Apr 12, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70833
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method adjusts a first element of a lithography apparatus toward a second element of the lithography apparatus via a tunable spacer which is arranged between the first element and the second element. The method includes: determining an actual location of the first element; determining a nominal location of the first element; unloading the tunable spacer; adjusting a height of the tunable spacer to bring the first element from the actual location to the nominal location; and loading the tunable spacer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.