Patent · US Active

Processing of solid micron sized particles for rapid deposition on substrate surfaces with uniform particle distribution

US11465179B2 · kind B2 · utility

0Cited by
6References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 17, 2019
Grant dateOct 11, 2022
Priority date
Expiry dateJun 26, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2015/1014
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

This application relates generally to a method and apparatus to deposit particles onto one or more coupons, and harvest particles from one or more coupons, which may beneficially provide a more uniform or localized distribution of particles over a specified area on each coupon. The application relates to a method and apparatus for depositing particles onto one or more coupons using a sieve. The application also relates to a method and apparatus for depositing particles onto one or more coupons using a dust storm. The particle loadings achieved on each coupon or across an individual coupon may be substantially uniform. The application further relates to a laser-based method and apparatus for transferring particles deposited at localized points on a source coupon to a different substrate for further use.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.