Patent · US Active

Block copolymer comprising block having polysilane skeleton and block having polysilazane skeleton

US11466127B2 · kind B2 · utility

1Cited by

1References

13Claims

0Family size

Assignee

Merck Patent GmbH · DE

Inventors

Takashi Fujiwara · Suginami, JP
Yuji Tashiro · Hiroshima, JP

Key dates

Filing date	May 29, 2019
Grant date	Oct 11, 2022
Priority date	—
Expiry date	May 29, 2039

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08G77/06
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

[Problem] To provide a novel polymer, which fills trenches having narrow widths and high aspect ratios and can form a thicker film. [Means for Solution] The block copolymer comprises a linear or cyclic block A having a polysilane skeleton comprising 5 or more silicon and a block B having a polysilazane skeleton comprising 20 or more silicon.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.