Apparatus and method for the gas treatment
US11471827B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 16, 2018 |
| Grant date | Oct 18, 2022 |
| Priority date | — |
| Expiry date | Jul 18, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/40
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for the gas treatment including a reaction chamber. The reaction chamber including an inlet opening of a flow of gas to be treated; means for the formation of ionizing electrical discharges adapted to interact with the gas to be treated to form a plasma state for obtaining a flow of treated gas which includes at least a high-added value fraction and at least a waste fraction; an outlet opening of the high-added value fraction arranged downstream of the means for the formation with respect to the direction of forward movement of the flow of gas to be treated inside the reaction chamber; reintroduction means for reintroducing the waste fraction inside the reaction chamber, and the reintroduction means being arranged downstream of the means for the formation with respect to the direction of forward movement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.