Patent · US Active

Method for producing damper structures on a micromechanical wafer

US11472698B2 · kind B2 · utility

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3Claims
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Key dates

Filing dateApr 5, 2021
Grant dateOct 18, 2022
Priority date
Expiry dateMay 18, 2041

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2203/01
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A method for producing damper structures on a micromechanical wafer. The method includes: providing an at least partially UV-transparent master mold for molding damper structures; inserting and pressing a micromechanical wafer into the master mold so that micromechanical structures in the wafer are aligned in relation to the damper structures; filling the master mold with UV-curing LSR and subsequent UV irradiation; and mold release and removal of the connected structure of the micromechanical wafer with attached dampers. A method for producing a singulated MEMS chip comprising a UV-cured damper is also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.