Patent · US Active

Mask and method for manufacturing the same, lithography method, display panel, display device and exposure device

US11474434B2 · kind B2 · utility

0Cited by

1References

15Claims

0Family size

Assignees

Inventors

Dengfeng Wang · Beijing, CN
Zhou Rui · Beijing, CN
Maoxiu Zhou · Beijing, CN
Haipeng Yang · Beijing, CN
Lei Guo · Williamsburg, US
Lin Chen · Beijing, CN

Key dates

Filing date	Mar 20, 2020
Grant date	Oct 18, 2022
Priority date	—
Expiry date	Dec 25, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/2004
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A mask is provided in embodiments of the disclosure, at least including: a first light transmission area provided with a first optical filter film; and a second light transmission area provided with a second optical filter film; the first optical filter film and the second optical filter film comprise respective materials through which light of different frequency ranges is optically filtered, respectively. A method for manufacturing a mask, a lithography method, a display panel, a display device, and an exposure device are further provided in embodiments of the disclosure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.