Droplet deposition apparatus
US11478812B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 25, 2019 |
| Grant date | Oct 25, 2022 |
| Priority date | — |
| Expiry date | Nov 25, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D3/042
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A droplet deposition apparatus includes a standing wave generator including ultrasonic wave oscillators, a droplet supplier to supply a droplet, a workpiece retainer to retain a workpiece in a predetermined space, and a controller configured or programmed to execute causing the standing wave generator to form a standing wave in the space, causing the droplet supplier to supply the droplet to a node of the standing wave generated in the space, and bringing close to each other a predetermined position on the workpiece retained by the workpiece retainer and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.