Patent · US Active

Method for producing at least one recess in a material by means of electromagnetic radiation and subsequent etching process

US11478880B2 · kind B2 · utility

0Cited by

8References

9Claims

0Family size

Assignee

LPKF LASER & ELECTRONICS AG · DE

Inventors

Roman Ostholt · Langenhagen, DE
Norbert Ambrosius · Kevelaer, DE
Arne Schnoor · Hannover, DE
Daniel Dunker · Hannover, DE

Key dates

Filing date	Mar 5, 2018
Grant date	Oct 25, 2022
Priority date	—
Expiry date	Aug 23, 2039

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81C2201/0143
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A method for creating at least one recess, in particular an aperture, in a transparent or transmissive material, includes: selectively modifying the material along a beam axis by electromagnetic radiation; and creating the at least one recess by one or more etching steps, using different etching rates in a modified region and in non-modified regions. The electromagnetic radiation produces modifications having different characteristics in the material along the beam axis such that the etching process in the material is heterogeneous and the etching rates differ from one another in regions modified with different characteristics under unchanged etching conditions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.