Secondary monitoring system for a machine under test
US11480603B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2020 |
| Grant date | Oct 25, 2022 |
| Priority date | — |
| Expiry date | Apr 30, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB64D2045/0085
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A testing system for monitoring a machine under test is disclosed and includes one or more high frequency sensors configured to generate a sensor signal that is representative of an operating parameter of the machine. The high frequency sensors have a required high frequency sampling rate. The testing system also includes a notification device configured to generate a notification indicating the operating parameter monitored by the high frequency sensors has exceeded a predefined threshold value and a data acquisition control module configured to monitor the high frequency sensors at a first sampling rate. The testing system also includes a monitoring control module in electronic communication with the notification device. The monitoring control module is configured to monitor the high frequency sensors at a second sampling rate that is greater than the first sampling rate and at least equal to the required high frequency sampling rate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.