In situ creation of planar natural feature targets
US11481982B2 · kind B2 · utility
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3References
48Claims
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Assignee
Inventors
Key dates
| Filing date | Jul 1, 2020 |
| Grant date | Oct 25, 2022 |
| Priority date | — |
| Expiry date | Dec 4, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30244
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Disclosed are a system, apparatus, and method for in-situ creation of planar natural feature targets. In one embodiment, a planar target is initialized from a single first reference image one or more subsequent images are processed. In one embodiment, the planar target is tracked in six degrees of freedom upon the processing of the one or more subsequent images and a second reference image is selected from the processed one or more subsequent images. In one embodiment, upon selecting the second reference image the planar target is refined to a more accurate planar target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.