Composition for depositing thin film, manufacturing method for thin film using the composition, thin film manufactured from the composition, and semiconductor device including the thin film
US11482593B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Oct 6, 2020 |
| Grant date | Oct 25, 2022 |
| Priority date | — |
| Expiry date | Nov 20, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B12/30
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Disclosed are a composition for depositing a thin film including an organometallic compound including strontium, barium, or a combination thereof; and at least one unshared electron pair-containing compound represented by Chemical Formula 1, a method of manufacturing a thin film using the composition for depositing the thin film, and the thin film manufactured from the composition for depositing the thin film, and a semiconductor device including the thin film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.