Patent · US Active

Quartz glass component of high thermal stability, semifinished product therefor, and method for producing the same

US11485669B2 · kind B2 · utility

0Cited by

3References

11Claims

0Family size

Assignee

HERAEUS QUARZGLAS GMBH & CO. KG · DE

Inventors

Christian Schenk · Ingelheim am Rhein, DE
Nadine Tscholitsch · Hanau, DE
Thomas Baier · Birkenfeld, DE

Key dates

Filing date	Jul 9, 2018
Grant date	Nov 1, 2022
Priority date	—
Expiry date	Feb 4, 2041

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03C2217/478
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

In a known method for producing a quartz glass component, a crystal formation layer containing a crystallization promoter is produced on a coating surface of a base body of quartz glass. Starting therefrom, to provide a method for producing a quartz glass component of improved thermal strength and long-term stability which displays a comparatively small deformation particularly also in the case of rapid heating-up processes, it is suggested according to one aspect that a porous crystal formation layer containing amorphous SiO2 particles is produced with a mean thickness in the range of 0.1 to 5 mm, and that a substance which contains cesium and/or rubidium is used as the crystallization promoter.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.