Method, non-volatile memory and control device
US11486040B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 18, 2019 |
| Grant date | Nov 1, 2022 |
| Priority date | — |
| Expiry date | May 2, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T17/05
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method comprises: forming a first layer stack on a first substrate by means of a multiplicity of coating processes, each coating process of which forms at least one layer of the first layer stack; detecting an optical spectrum of the first layer stack; determining correction information for at least one coating process of the multiplicity of coating processes using a model, wherein the model provides a right-unique mapping function between a deviation of the spectrum from a desired spectrum and the correction information; and changing at least one control parameter for controlling the at least one coating process of the multiplicity of coating processes using the correction information; and forming a second layer stack on the first or a second substrate by means of the multiplicity of coating processes using the changed control parameter, each coating process of which forms at least one layer of the second layer stack.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.