Target design process for overlay targets intended for multi-signal measurements
US11487929B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 2, 2020 |
| Grant date | Nov 1, 2022 |
| Priority date | — |
| Expiry date | Apr 6, 2041 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, system and computer program product for determination of a metrology target design, comprising generating a first candidate target design for a selected design type compatible with one or more metrology tools or and a set of boundaries for a simulation range Measurement of the first target design with the one or more metrology tools within the boundaries of the simulation range is simulated for two or more measurement settings to generate one or more performance metrics. Simulating the measurement takes into account layer properties of one or more layers in a stack profile. The optimal design is determined from at least the performance metrics based on one or more selection criteria and then sent or stored.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.