Electron beam melting additive manufacturing machine with dynamic energy adjustment
US11491575B2 · kind B2 · utility
0Cited by
6References
20Claims
0Family size
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Key dates
| Filing date | Apr 16, 2019 |
| Grant date | Nov 8, 2022 |
| Priority date | — |
| Expiry date | Nov 20, 2040 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/25
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An electron beam melting machine and a method of operation are provided which maintains constant energy absorption within a build layer by adjusting an incident energy level to compensate for energy not absorbed by the additive powder. This unabsorbed energy is detected in the form of electron emissions, which include secondary electrons, backscattered electrons, and/or electrons which are transmitted through the build platform.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.