Plasma treating an implant
US11495438B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2018 |
| Grant date | Nov 8, 2022 |
| Priority date | — |
| Expiry date | Nov 4, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2245/36
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method is provided for treating an implant in a medical care center prior to using the implant in a medical procedure. The method comprises applying a plasma-generating electromagnetic (EM) field using at least one electrode so as to generate plasma in a vicinity of the implant while displacing the electrode and the implant relative to one another. A portable plasma module and a docking station configured to connect to the portable plasma module, thereby forming a plasma generating system, are also provided. A plasma generating apparatus for treating an implant prior to using the implant in a medical procedure is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.