Selective step coverage for micro-fabricated structures
US11499218B2 · kind B2 · utility
0Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 30, 2019 |
| Grant date | Nov 15, 2022 |
| Priority date | — |
| Expiry date | Apr 16, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2229/07
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.