Multilayer mirror for reflecting EUV radiation and method for producing the same

US11500137B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Philipp Naujok · Jena, DE
• Sergiy Yulin · Jena, DE
• Norbert Kaiser · Markt Taschendorf, DE

Key dates

• Filing date: Sep 25, 2017
• Grant date: Nov 15, 2022
• Expiry date: Jan 30, 2040

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K2201/061
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A multilayer mirror for reflecting Extreme Ultraviolet (EUV) radiation and a method for producing the same are disclosed. In an embodiment a multilayer mirror includes a layer sequence having a plurality of alternating first layers and second layers, the first layers including lanthanum or a lanthanum compound and the second layers including boron, wherein the second layers are doped with carbon, and wherein a molar fraction of carbon in the second layers is 10% or less.