Coating liquid for forming metal oxide film, oxide film, field-effect transistor, and method for producing the same
US11502203B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Mar 22, 2018 |
| Grant date | Nov 15, 2022 |
| Priority date | — |
| Expiry date | Aug 31, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02488
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A coating liquid for forming a metal oxide film, the coating liquid including: a metal source, which is at least one selected from the group consisting of inorganic salts, oxides, hydroxides, metal complexes, and organic acid salts; at least one alkali selected from the group consisting of organic alkalis and inorganic alkalis; and a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.