Patent · US Active

Pattern filling in garment pieces

US11503870B2 · kind B2 · utility

2Cited by
5References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 12, 2019
Grant dateNov 22, 2022
Priority date
Expiry dateJun 27, 2040

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P90/30
  • WIPO fieldIT methods for management
  • WIPO sectorElectrical engineering

Abstract

In implementations of pattern filling in garment pieces, a pattern filling system represents a first garment piece as a first curve and a second garment piece as a second curve. The system determines a relationship between the first garment piece and the second garment piece by comparing the first curve and the second curve. The pattern filling system generates a visually pleasing fill pattern for the first garment piece and the second garment piece based on the determined relationship.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.