Patent · US Active

Exhaust gas purification device

US11504704B2 · kind B2 · utility

0Cited by
14References
5Claims
0Family size

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Key dates

Filing dateAug 24, 2021
Grant dateNov 22, 2022
Priority date
Expiry dateAug 24, 2041

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02T10/12
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

An exhaust gas purification device includes a substrate including an upstream end and a downstream end and having a length Ls; a first containing Pd particles, extending between the upstream end and a first position, and being in contact with the substrate; a second containing Rh particles, extending between the downstream end and a second position, and being in contact with the substrate; and a third catalyst layer containing Rh particles, extending between the upstream end and a third position, and being in contact with at least the first catalyst layer, wherein an average of a Rh particle size distribution is from 1.0 to 2.0 nm, and a standard deviation of the Rh particle size distribution is 0.8 nm or less in each of the second catalyst layer and the third catalyst layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.