Salt, acid generator, resist composition and method for producing resist pattern
US11505524B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 18, 2021 |
| Grant date | Nov 22, 2022 |
| Priority date | — |
| Expiry date | Jun 29, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A salt represented by formula (I): wherein R1 and R2 each independently represent a hydroxy group, —O—R10, —O—CO—O—R10 or —O-L1-CO—O—R10; L1 represents an alkanediyl group having 1 to 6 carbon atoms; R4, R5, R7 and R8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; R10 represents an acid-labile group; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI− represents an organic anion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.