Photoresist material, method of fabcricating same, and color filter substrate
US11506975B2 · kind B2 · utility
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Key dates
| Filing date | Jan 10, 2020 |
| Grant date | Nov 22, 2022 |
| Priority date | — |
| Expiry date | Oct 29, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/105
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist material, a method of fabricating the same, and a color filter substrate are described. The photoresist material has an oligomer segment having a chemical structural formula of: wherein a value of n is 1 to 2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.