Reticle retaining system
US11508592B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 28, 2019 |
| Grant date | Nov 22, 2022 |
| Priority date | — |
| Expiry date | May 13, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/32
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The instant disclosure discloses a reticle retaining system comprising an inner pod and an outer pod. The inner pod is configured to receive a reticle that includes a first identification feature. The inner pod comprises an inner base having a reticle accommodating region generally at a geometric center thereof and surrounded by a periphery region, and an inner cover configured to establish sealing engagement with the inner base. The inner base has a first observable zone defined in the reticle accommodating region correspondingly arranged to allow observation of the first identification feature. The outer pod is configured to receive the inner base. The outer pod comprises an outer base having a second observable zone defined thereon observably aligned to the first observable zone of the inner pod upon receiving the inner pod, and an outer cover configured to engage the outer base and cover the inner pod.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.