Apparatus for and method of manufacturing semiconductor device
US11512389B2 · kind B2 · utility
0Cited by
9References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2019 |
| Grant date | Nov 29, 2022 |
| Priority date | — |
| Expiry date | Feb 4, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed are an apparatus for and a method of manufacturing a semiconductor device. The apparatus includes a chamber, an evaporator that evaporates an organic source to provide a source gas on a substrate in the chamber, a vacuum pump that pumps the source gas and air from the chamber, an exhaust line between the vacuum pump and the chamber, and an analyzer connected to the exhaust line. The analyzer detects a derived molecule produced from the organic source and determines a replacement time of the evaporator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.