System and method for ablation assisted nanostructure formation for graded index surfaces for optics
US11525945B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Jun 22, 2018 |
| Grant date | Dec 13, 2022 |
| Priority date | — |
| Expiry date | Dec 29, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K2103/54
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A system and method is disclosed for forming a graded index (GRIN) on a substrate. In one implementation the method may involve applying a metal layer to the substrate. A fluence profile of optical energy applied to the metal layer may be controlled to substantially ablate the metal layer to create a vaporized metal layer. The fluence profile may be further controlled to control a size of metal nanoparticles created from the vaporized metal layer as the vaporized metal layer condenses and forms metal nanoparticles, the metal nanoparticles being deposited back on the substrate to form a GRIN surface on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.