Patent · US Active

Nanofabrication system with dispensing system for rotational dispensing

US11526076B2 · kind B2 · utility

0Cited by

8References

19Claims

0Family size

Assignee

Canon Kabushiki Kaisha · JP

Inventors

Craig William Cone · Austin, US
Qi Ni · Pflugerville, US
Steven Wayne Burns · Austin, US

Key dates

Filing date	Nov 18, 2020
Grant date	Dec 13, 2022
Priority date	—
Expiry date	Nov 18, 2040

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB05C11/08
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A dispensing system comprises a first dispenser and a second dispenser each including a first end, a second end, a longitudinal axis extending through the first end and the second end, and a set of nozzles arranged about the longitudinal axis. The first dispenser is positioned relative to the second dispenser such that the longitudinal axis of the first dispenser is non-coaxial with the longitudinal axis of the second dispenser. The dispensing system also comprises a substrate chuck configured to hold a substrate and a rotation mechanism configured to rotate the substrate chuck around a rotation axis or configured to rotate the first dispenser and the second dispenser around the rotation axis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.