Imprint apparatus and method of manufacturing article
US11526090B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 19, 2020 |
| Grant date | Dec 13, 2022 |
| Priority date | — |
| Expiry date | Apr 2, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2037/90
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides an imprint apparatus that forms an imprint material pattern on a substrate by using a mold, comprising: a discharge unit on which a plurality of discharge outlets configured to discharge an imprint material are arranged; a measurement unit configured to measure a relative tilt between the discharge unit and the substrate; and a control unit configured to control a process of causing the discharge unit to discharge the imprint material while relatively moving the discharge unit and the substrate to each other, wherein the control unit is configured to change a relative movement direction of the discharge unit and the substrate in the process in accordance with the relative tilt measured by the measurement unit so as to reduce an arrangement error of the imprint material, discharged from the plurality of discharge outlets, on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.