Method for measuring gas temperature in plasma
US11530955B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 24, 2020 |
| Grant date | Dec 20, 2022 |
| Priority date | — |
| Expiry date | Jun 4, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/2746
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention discloses a device for measuring gas temperature in plasma, including: a vacuum chamber, a fiber optic temperature sensor, a quartz tube, a circulator, a spectrometer, a broadband light source and a computer. One end of the quartz tube is inserted into the vacuum chamber. The fiber optic temperature sensor is located in the plasma in the vacuum chamber and fixed to the quartz tube. The fiber optic temperature sensor is connected to the circulator by means of an optical fiber passing through the quartz tube. The circulator is connected to the broadband light source and the spectrometer through optical fibers, respectively. The spectrometer is electrically connected to the computer which is configured to read and record spectra collected by the spectrometer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.