Patent · US Active

Method for measuring a seam on aircraft skin based on large-scale point cloud

US11532121B2 · kind B2 · utility

0Cited by
1References
7Claims
0Family size

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Key dates

Filing dateFeb 7, 2021
Grant dateDec 20, 2022
Priority date
Expiry dateMar 11, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06T2207/30252
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

A method for measuring a seam on aircraft skin based on a large-scale point cloud is disclosed. A point cloud density of each point in an aircraft skin point cloud is calculated. Seam and non-seam point clouds are divided according to a discrepancy of the calculated point cloud density. A point is selected from the point cloud of the seam area, and a section at the point is extracted. A certain range of the seam and non-seam point clouds is projected to the section and a projected point cloud is acquired. A calculation model of flush and gap is constructed, and the flush and the gap of the aircraft skin seam at the measuring point is calculated according to the projected point cloud and the calculation model.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.