Precise plasma control system
US11532457B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2021 |
| Grant date | Dec 20, 2022 |
| Priority date | — |
| Expiry date | Jul 15, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02M3/338
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Some embodiments include a pulsing power supply comprising a power supply and a transformer comprising: a transformer core; a primary winding wrapped around a portion of the transformer core, the primary winding having a first lead and a second lead; and a secondary winding wrapped around a portion of the transformer core. The pulsing power supply may also include a first switch electrically connected with the first lead of the primary winding and the power supply; and a second switch electrically connected with the second lead of the primary winding and the power supply, wherein the first switch and the second switch are opened and closed at different time intervals. The pulsing power supply may also include a pulsing output electrically coupled with the secondary winding of the transformer that outputs pulses having a voltage greater than about 2 kV and with pulse frequencies greater than 1 kHz.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.