Patent · US Active

Tantalum powder and preparation method therefor

US11534830B2 · kind B2 · utility

0Cited by
5References
9Claims
0Family size

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Key dates

Filing dateDec 27, 2017
Grant dateDec 27, 2022
Priority date
Expiry dateDec 27, 2037

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB22F2998/10
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A tantalum powder, a tantalum powder compact, a tantalum powder sintered body, a tantalum anode, an electrolytic capacitor and a preparation method for tantalum powder. The tantalum powder contains boron element, and the tantalum powder has a specific surface area of greater than or equal to 4 m2/g; the ratio of the boron content of the tantalum powder to the specific surface area of the tantalum powder is 2˜16; the boron content is measured in weight ppm, and the specific surface area is measured in m2/g; Powder that can pass through a ρ-mesh screen in the tantalum powder accounts for over 85% of the total weight of the tantalum powder, where ρ=150˜170; and the tantalum powder with high CV has a low leakage current and dielectric loss, and good moldability.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.