Photosensitive compositions and applications thereof
US11537045B2 · kind B2 · utility
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1References
20Claims
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Assignee
Inventors
Key dates
| Filing date | Oct 17, 2019 |
| Grant date | Dec 27, 2022 |
| Priority date | — |
| Expiry date | Jul 27, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G2261/94
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain multifunctional crosslinking agents, and two or more phenolic compounds which are resistant to thermo-oxidative chain degradation and exhibit improved mechanical properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.