Patent · US Active

Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom

US11542362B2 · kind B2 · utility

1Cited by

173References

29Claims

0Family size

Assignee

Align Technology, Inc. · US

Inventors

Robert Liska · Schleinbach, AT
Christian Gorsche · Wien, AT
György Harakaly · Wien, AT
Markus Kury · Wien, AT
Jürgen Stampfl · Wien, AT
Peter Dorfinger · Los Altos Hills, US
Yan Chen · Cupertino, US
Chunhua Li · Cupertino, US
Srinivas Kaza · Burr Ridge, US

Key dates

Filing date	Oct 15, 2019
Grant date	Jan 3, 2023
Priority date	—
Expiry date	Oct 15, 2039

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P10/25
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.