Operating light sources to project patterns for disorienting visual detection systems
US11543502B2 · kind B2 · utility
1Cited by
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8Claims
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Key dates
| Filing date | Jul 23, 2019 |
| Grant date | Jan 3, 2023 |
| Priority date | — |
| Expiry date | Sep 15, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04K2203/24
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Methods and systems fort operating one or more light sources to project adversarial patterns generated to disorient a machine learning based detection system, comprising generating one or more adversarial patterns configured to disorient the machine learning based detection system and operating one or more light sources configured to project one or more of the adversarial pattern(s) in association with the targeted object in order to disorient the machine learning based detection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.