Inorganic matrix nanoimprint lithographs and methods of making thereof with reduced carbon
US11543584B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Jun 30, 2021 |
| Grant date | Jan 3, 2023 |
| Priority date | — |
| Expiry date | Jul 3, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2027/0174
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The disclosure provides high refractive index ceramic material nanoimprint lithography (NIL) gratings having a relatively lower amount of carbon compared to traditional NIL gratings, and methods of making and using thereof, and devices including such gratings. The ceramic material includes one or more of titanium oxide, zirconium oxide, hafnium oxide, tungsten oxide, zinc tellurium, gallium phosphide, or any combination or derivative thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.