Patent · US Active

Inorganic matrix nanoimprint lithographs and methods of making thereof with reduced carbon

US11543584B2 · kind B2 · utility

0Cited by
30References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 30, 2021
Grant dateJan 3, 2023
Priority date
Expiry dateJul 3, 2041

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B2027/0174
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The disclosure provides high refractive index ceramic material nanoimprint lithography (NIL) gratings having a relatively lower amount of carbon compared to traditional NIL gratings, and methods of making and using thereof, and devices including such gratings. The ceramic material includes one or more of titanium oxide, zirconium oxide, hafnium oxide, tungsten oxide, zinc tellurium, gallium phosphide, or any combination or derivative thereof.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.