Patent · US Active

Electroplating method

US11549189B1 · kind B1 · utility

0Cited by
1References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 4, 2022
Grant dateJan 10, 2023
Priority date
Expiry dateMar 4, 2042

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D15/00
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present disclosure provides an electroplating method, comprising providing an electroplating solution, wherein the electroplating solution includes an effective microorganisms aqueous solution and metal chloride; disposing a workpiece, wherein at least a part of the workpiece is in contact with the electroplating solution; and performing an electroplating process to electroplate metal of the metal chloride onto the workpiece.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.