Patent · US Active

Enhanced microfabrication using electrochemical techniques

US11549903B1 · kind B1 · utility

0Cited by
3References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 10, 2019
Grant dateJan 10, 2023
Priority date
Expiry dateNov 12, 2041

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2201/0139
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method is provided for subtractively processing a layer of etchable material formed over an electrically conductive surface region of a workpiece. The workpiece is immersed in a liquid solution, generally but not exclusively a conductive solution, that comprises an etchant for the etchable material, so that etching of the etchable material is initiated. An electric circuit is connected to include a control electrode, a reference electrode, and the electrically conductive surface region of the workpiece. The electric circuit is used to monitor the development process dynamically at each of a plurality of intervals during the etching. The etching is terminated when the electrochemical signal satisfies a criterion indicating that the etching is complete.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.