Devices, systems, and methods of generating and providing a target topographic map for finishing a photomask blank subject to functional requirements on flatness
US11551347B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 24, 2020 |
| Grant date | Jan 10, 2023 |
| Priority date | — |
| Expiry date | Jul 15, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Devices, systems, and methods of generating and providing a target topographic map for finishing a photomask blank are disclosed. A method includes receiving topographic data corresponding to an uncompleted photomask blank, receiving functional specifications for flatness of an acceptable photomask blank, and generating the target topographic map for first and/or second major surfaces of the blank, which provides instructions for removing material from the first and/or second major surfaces such that the first and second major surfaces achieve a flatness that passes each functional specification. The amount of material removed reflects a reduction in material necessary to pass the functional specifications. The method further includes transmitting the target topographic map to the finishing device to utilize a finishing technique to implement changes to the photomask blank according to the target topographic map by removing the material from the photomask blank to achieve a photomask blank that passes the functional specifications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.