Alkali-free borosilicate glasses with low post-HF etch roughness

US11554984B2 · kind B2 · utility

Assignee

• CORNING INCORPORATED · US

Inventors

• Timothy Michael Gross · Waverly, US
• Yuhui Jin · Corning, US
• Ruchirej Yongsunthon · Corning, US
• Liying Zhang · Singapore, SG

Key dates

• Filing date: Feb 11, 2019
• Grant date: Jan 17, 2023
• Expiry date: Feb 13, 2041

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C03C2204/08
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

An article comprises a glass substrate. The glass substrate has a first surface having a plurality of vias therein, and a second surface parallel to the first surface. At least one of the first surface and the second surface is an etched surface having a surface roughness (Ra) of 0.75 nm or less. The glass substrate comprises, in mol percent on an oxide basis: 65 mol %≤SiO2≤75 mol %; 7 mol %≤Al2O3≤15 mol %; 26.25 mol %≤RO+Al2O3−B2O3; 0 mol %≤R2O≤2 mol %. RO=MgO+CaO+SrO+BaO+ZnO. R2O=Li2O+Na2O+K2O+Rb2O+Cs2O.