Method and system for controlling a laser profiler
US11555694B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 17, 2020 |
| Grant date | Jan 17, 2023 |
| Priority date | — |
| Expiry date | Jan 27, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N23/76
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for controlling a laser profiler, the laser profiler being configured for generating a laser line on a surface to be inspected, the method comprising: receiving an image of the laser line; determining an actual intensity of the laser line; calculating an amplification factor for the laser line based on the actual intensity of the laser line, a target intensity for the laser line, a power of the laser, a camera gain of the camera and an exposure time of the laser line on the surface to be inspected, the amplification factor allowing the actual intensity of the laser line to reach the target intensity while minimizing the power of the laser; and based on the calculated amplification factor, adjusting at least one parameter of the laser profiler so that the actual intensity of the laser line corresponds to the target intensity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.