Nanostructure featuring nano-topography with optimized electrical and biochemical properties

US11562907B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Cristina Camagong · Ridgefield, US
• Hariklia Deligianni · Alpine, US
• Damon B. Farmer · White Plains, US
• Andrei Fustochenko · New City, US
• Ying He · Norwalk, US
• Emily R. Kinser · Poughkeepsie, US
• Yu Luo · Nanhu, CN
• Roy R. Yu · Poughkeepsie, US

Key dates

• Filing date: Nov 29, 2018
• Grant date: Jan 24, 2023
• Expiry date: Sep 8, 2040

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B82Y40/00
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A method for forming a nanostructure includes coating an exposed surface of a base layer with a patterning layer. The method further includes forming a pattern in the patterning layer including nano-patterned non-random openings, such that a bottom portion of the non-random openings provides direct access to the exposed surface of the base layer. The method also includes depositing a material in the non-random openings in the patterning layer, such that the material contacts the exposed surface to produce repeating individually articulated nano-scale features. The method includes removing remaining portions of the patterning layer. The method further includes forming an encapsulation layer on exposed surfaces of the repeating individually articulated nanoscale features and the exposed surface of the base layer.