Patent · US Active

Ultra-compact inductor made of 3D Dirac semimetal

US11563078B2 · kind B2 · utility

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2References
20Claims
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Key dates

Filing dateMar 12, 2020
Grant dateJan 24, 2023
Priority date
Expiry dateApr 20, 2041

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/0272
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Ultra-compact inductor devices for use in integrated circuits (e.g., RF ICs) that use 3-dimensional Dirac materials for providing the inductor. Whereas inductors currently require significant real estate on an integrated circuit, because they require use of an electrically conductive winding around an insulative core, or such metal deposited in a spiral geometry, the present devices can be far more compact, occupying significantly less space on an integrated circuit. For example, an ultra-compact inductor that could be included in an integrated circuit may include a 3-dimensional Dirac material formed into a geometric shape capable of inductance (e.g., as simple as a stripe or series of stripes of such material), deposited on a substantially non-conductive (i.e., insulative) substrate, on which the Dirac material in the selected geometric shape is positioned. Low temperature manufacturing methods compatible with CMOS manufacturing are also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.