Patch library system for stitching along a predetermined path
US11566356B2 · kind B2 · utility
1Cited by
15References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 12, 2021 |
| Grant date | Jan 31, 2023 |
| Priority date | — |
| Expiry date | Jul 4, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/20081
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Disclosed are various systems and features for use with a machine, such as a sewing machine, to facilitate patch library systems that may enable the storage and retrieval of patch configuration information. Such systems and features may be useful in the context of performing an action along a self-guided path on a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.