Patent · US Active

Light absorbing device, manufacturing method thereof, and photoelectrode

US11567249B2 · kind B2 · utility

1Cited by
1References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 25, 2018
Grant dateJan 31, 2023
Priority date
Expiry dateJul 16, 2039

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB82Y30/00
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

This light absorbing device includes: a light reflecting layer; a dielectric layer disposed on the light reflecting layer; and a plurality of metal nanostructures disposed on the dielectric layer. A portion of each of the plurality of metal nanostructures is buried in the dielectric layer and another portion thereof is exposed to the outside.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.