Display apparatus and method of manufacturing the same
US11569269B2 · kind B2 · utility
0Cited by
3References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 8, 2021 |
| Grant date | Jan 31, 2023 |
| Priority date | — |
| Expiry date | Apr 5, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/40
Abstract
A display apparatus is provided which may include a substrate including a display area and a non-display area adjacent to the display area, a first thin-film transistor disposed on the substrate and including a first semiconductor layer including an oxide semiconductor material, and a second thin-film transistor disposed on the substrate and including a second semiconductor layer including a silicon semiconductor material, wherein a surface roughness of the first semiconductor layer is increased by plasma treatment. A method of manufacturing the display apparatus is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.