White light source and illumination apparatus for lighting in lithography process
US11569420B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2019 |
| Grant date | Jan 31, 2023 |
| Priority date | — |
| Expiry date | Oct 31, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02B20/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention relates to a white light source and illumination apparatus for limiting wavelength of 450 nm or less and, more particularly, to a white light source and illumination apparatus for lighting in a lithography or other process, capable of realizing white light even with the limited wavelength of 450 nm or less light. Disclosed is a white light illumination apparatus for limiting wavelength of 450 nm or less, the apparatus comprising a white light source comprising: a blue light-emitting diode element having an emission peak wavelength of 450-490 nm; and an encapsulation layer which encapsulates the blue light-emitting diode element, wherein in the encapsulation layer, one or more phosphors which realize white light emission along with the blue light-emitting diode element, and a blocking agent which blocks light of wavelength of 450 nm or less are scattered, thus forming a first peak region at a wavelength of 450-490 nm and a second peak region which realizes white light emission in combination with the first peak region and limiting the wavelength of 450 nm or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.